FIB Nanostructures

Invited Speakers:

  • Feridun Ay, Anadolu University, Turkey
    Focused-ion-beam nano-structuring of photonic cavities in dielectric materials
  • Fengzhou Fang, Tianjin University, China
    Nanofabrication by FIB
  • Vera La Ferrara, Portici Research Center,Piazzale Enrico Fermi,80055 Portici (NA), Italy
  • Remy Fulcrand,  University Lyon 1, France
    FIB design for nanofluidic applications
  • Marty Gregg, Queen’s University Belfast, UK
    Accessing Nanoscale Physics of Ferroics by FIB-patterning of Single Crystals
  • Rachel Goldman, University of Michigan, USA
    Ion-Induced Nanostructure Formation on Compound Semiconductor Surfaces
  • Changzhi Gu, Institute of Physics Chinese Academy of Sciences, China
     3D nanostructures fabricated by FIB
  • Achim Nadzeyka, Raith, Germany
    Ion Beam Lithography for advanced applications in plasmonics, nanobio and graphene
  • Ricardo Ibarra, Universidad de Zaragoza, Spain
    Superconducting nanostructures by FIB
  • Alois Lugstein, Vienna University of Technology, Austria
    Advanced nanopattern formation by a FIB inducedsubtractive self organization process
  • Richard Langford, University of Cambridge, UK
    Focused Ion Beam Nano-patterning  with both Gallium and Neon
  • Paul Warburton, University College London, UK
    FIB methods for superconducting, semiconducting and plasmonic nanodevices
  • Arup Kumar Raychaudhuri, S.N.Bose National Center for Basic Sciences, India
    FIB as an enabling tool for fabrication of  nano devices
  • Gemma Rius, Nagoya Institute of Technology, Nagoya, Japan
    Focused ion beam induced deposition of as a technique for transfer-free graphene. A processing approach.
  • Ashley Slattery,  Flinders University, Australia
    Application of Focused Ion Beam Processes to Atomic Force Microscopy
  • Jining Sun, Heriot-Watt University, UK
    Applications of FIB machining in micro/nano technology
  • Jose M. De Teresa, Universidad de Zaragoza, Spain
    New perspectives in Focused Ion Beam Induced Deposition
  • Ivo Utke, Swiss Federal Laboratories for Materials Science and Technology, Switzerland
    Focused Ion Beam vs. Focused electron beam induced processing
  • Huimin Xie, Tsinghua University, China
    Fabrication technique of deformation carriers (gratings and speckle patterns) with FIB for micro/nano-scale deformation measurement
  • Zeev Zalevsky, Bar Ilan University, Israel
    Usage of Focused Ion Beam and Scanning Electron Microscope for Fabrication of Self Aligned Nanostructures

Workshop Chairs:

  • Zhiming M. Wang, Institute of Semiconductors CAS, China

Workshop Assistants:

  • Xingliang Xu, Institute of Semiconductors CAS, China
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