Metal-organic CVD

Invited Speakers:

  • Kihyun Choi, University of Tokyo, Japan
    Site-controlled growth of single GaN quantum dots in nanowires
  • Takashi Goto, Tohoku University, Japan
    High-speed deposition of highly oriented films by laser enhanced MOCVD
  • Dabing Li, Changchun Institute of Optics, Fine Mechanics and Physics, CAS, China
    Growth of AlN and AlGaN by High-temperature MOCVD
  • Natalia Morozova, The Siberian Branch of the Russian Academy of Sciences, Russia
    Film Materials on the Base of Platinum Group Metals Forming by MOCVD
  • Dong-Sing Wuu, National Chung Hsing University, Taiwan
    TBA
  • Cezhou Zhao, Xi’an Jiaotong–Liverpool University, China
    Crystal grain and dielectric relaxation of high-k thin films deposited by ALD and MOCVD

Workshop Chairs:

  • Zhiming M. Wang, Institute of Semiconductors CAS, China

Workshop Assistants:

  • Lina WAN, Institute of Semiconductors CAS, China
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Operating Organization

OAHOST
Sponsors
ISCAS
UARK

Springer